Application of graphene and carbon nanotube composite materials
Abstract
graphene and carbon nanotube composite materials have some physical characteristics including mechanics and electricity. Both of them are allotropes of each other and have many similarities. However, the composite materials including graphene and carbon nanotube have the all of the advantages, but also have the unique and different material structure. The composite materials have the potential influence on the special structure, especially modulation effect to match the more advanced requirements.
This research proposal will focus on the possible application of the create composite materials with graphene and carbon nanotube in the advanced production including the structure and special functions.
- Introduction
- History of research situation about graphene and carbon nanotube
- Constructing a neural network by using carbon nanotubes as a unit of simulated nerve cells
- A research about Graphene as a thermal conductive film, insulation protective layer
- A theoretical verification about the 3D structure of graphene and carbon nanotube composite material
- The potential development of the GCNCM
- The drawbacks of the GCNCM
- Preparation
(1), the preparation of composite materials. The preparation of both carbon nanotubes and graphene has been a challenging task, whether it is directed carbon nanotubes, or large-scale layer controllable independent crystal intact graphene. The challenges faced by composite materials will be greater, composite methods, device preparation temperature, controllability, etc., and the realization of any of these targets is a big problem. The controllability of composite preparation is the main breakthrough to realize the preparation possibility of the simplest products.
(2) the performance of the device. Although in theory, composite materials should have good performance, in practice, their performance is affected by many physical and chemical factors. The elimination of these factors, and control will require a lot of experiments to achieve.
(3) the rational characterization of materials, devices, and the corresponding means of characterization
- methodology
(1) the possibility of Chemical Vapor Deposition
(2) The construction of the all-carbon structure: This topic can be used as a reference at present. Through analysis, a large number of advanced processes for semiconductor fabrication will be used: (a). Lithography. , film deposition. 3, diffusion, and so on. And there are the following problems: 1, each process debugging. 2, unknown interference. 3, process matching. 4, device performance debugging
(3) Characterization methods: electrical, optical, mechanical and other performance tests, Raman spectroscopy, AFM, SEM, TEM material characterization
